BEAM
DIRECT LASER WRITER
Compact.
Up to 8" full-featured maskless lithography that fits on your desk.
Powerful.
Sub-micron resolution with single write field exposures in two seconds.
Intuitive.
Automatic features allow exposures in minutes. Perfect for rapid prototyping.
CONSISTENTLY SUBMICRON.
BEAM is equipped with a wide-FOV and large numerical aperture optics, making it suitable for high-resolution lithography.
GREYSCALE LITHOGRAPHY.
Our latest BEAM Engine Gen 2 allows up to 65536 grey levels, with software selectable dual wavelength (365+405) option.
MODULAR OPTICS.
BEAM is equipped with swappable wide-FOV and large numerical aperture optics
BEAM Engine Gen 2 (2025)
Our new optics engine is standard for all new BEAM systems and upgradeable for Gen 1 systems.
- The only maskless lithography tool with 4K hi-res DMD as option
- Interchangeable lens design (0.5 um resolution or 400 mm²/min)
- 10x faster exposures
- Seamless stitching between writefields
- Support up to 16-bit greyscale
SPEND LESS TIME IN THE CLEANROOM.
- Our UI was designed to be intuitive. WASD navigation. Right click anywhere to get there.
- Automatic image recognition aligns multilayer jobs in minutes.
- Ability to draw any shapes or write any text onto resist in seconds.
PRICING:
NANYTE BEAM is the most cost-effective desktop lithography tool. Send us an email or contact our partners for more info.
Be the first in your location to own a BEAM and enjoy a discount.
OUR MISSION:
Affordable lithography tools for all. We believe that nanotechnology is the future and tools for nanotech should be affordable. Buying a BEAM helps us develop more affordable tools.
Trusted by over 40 institutions worldwide
Our Partners
Asia Pacific
Americas/Europe
