BEAM · MASKLESS LITHOGRAPHY

Desktop masklesslithography.

Name: NANYTE BEAM
Brand: NANYTE
Availability: InStock

Sized for the lab bench, built for serious patterning.
<0.4 µm resolution · exposures in <0.1 s.

RESULTS · IN THE WILD

Patterned with BEAM.

Real samples, real labs.

Dry-film resist on copper
Cu / DFR · Single-layer exposure

Tapered nanowire bridges
AZ5214E · Single-layer exposure

Interdigitated capacitors
AZ5214E · Single-layer exposure

Cr nanowires after lift-off · SEM
Cr / Si · Lift-off, positive resist

2 µm pillars in HSQ
HSQ25 · Negative-tone exposure

Asymmetric split ring resonators
Metallized resist · Single-layer · metallized

Stitched grid over many writefields
ECI3007, 700 nm · 1 µm lines · stitched

Lion head · greyscale relief
HSQ 20 µm · Greyscale exposure

OPTICS

Consistently submicron.

BEAM is equipped with wide-FOV, large numerical aperture optics — high-resolution lithography across the full wafer.

01Industry-leading 4K hi-res DMD as option
02Interchangeable lens design — down to 0.5 µm
0310× faster exposures with Engine Gen 2
04Seamless stitching between writefields

Cr nanowires after lift off

Resolution

<0.4µm

Full 8" wafer, edge-to-edge.

Exposure

<0.1sec

Per writefield · 10× on Gen 2.

Greyscale

65,536levels

16-bit · 365 + 405 nm dual wavelength.

Trusted by

40+institutions

Universities, fabs, R&D labs.

BEAM ENGINE · GEN 2

GREYSCALE

65,536 levels of greyscale.

BEAM Engine Gen 2 enables true 16-bit greyscale lithography with software-selectable dual wavelength (365 + 405 nm).

0165,536 dose levels
0216-bit · software-selectable 365 / 405 nm
033D micro-optics, kinoforms, refractive lenses

BEAM SOFTWARE · v3.2

WORKFLOW

Less time in the cleanroom.

The BEAM software was designed to be intuitive. WASD navigation. Right-click anywhere to get there.

01Auto image-recognition aligns multilayer jobs in minutes
02Draw any shape or write any text directly onto resist
03Exposures complete in under 0.1 seconds

DESIGN

Draw masks in your browser.

Glyph is BEAM's companion design tool — a free GDSII mask editor that runs entirely in your browser. No install, no upload; your designs stay on your machine.

01AI-assisted drawing — prompt Claude to draft your layout, with one undo step per prompt so you can iterate safely
02Bring sketches, photos, or microscope captures straight in. Trace Bitmap converts them into editable GDS polygons
03Modern direct manipulation — alignment guides, dynamic-input HUD, AutoCAD-style precision drafting

Start using Glyph →

GLYPH · FREE TO USE

MISSION

Advanced lithography
for more labs.

01 / The Platform

NANYTE builds compact maskless lithography tools for labs that need serious patterning capability without the footprint, cost, or complexity of legacy systems.

02 / The Build

Behind BEAM is a small team of engineers and scientists who built every component from the ground up — optics, controllers, software. Making lithography this compact wasn't about shrinking what existed; it required redesigning what's inside.